Tungsten oxide-metal composite film is a film structure composed of two materials: tungsten oxide and metal. This composite film combines tungsten oxide and metal materials to form a composite structure, which has unique properties and application potential.
Tungsten oxide (WO3) is a semiconductor material with excellent photoelectric properties and catalytic activity. It is widely used in photocatalysis, electrochromic, electrochemical devices and other fields. Tungsten oxide thin films usually have high transparency, adjustable optical and electrical properties.
Metals are a class of materials with good electrical and thermal conductivity. Common metals include copper, aluminum, silver, gold, etc. Metal thin films have good electrical conductivity and mechanical properties, and can be used in applications such as electronic devices, sensors, and conductive coatings.
The tungsten oxide-metal composite film can be prepared by different preparation methods, such as physical vapor deposition, chemical vapor deposition, sputtering, etc., to form a composite structure on the substrate. During the preparation process, the metal and tungsten oxide are intersected and distributed to form a layered structure of a composite film.
Tungsten oxide-metal composite thin films have a variety of potential applications. They can be used to prepare photoelectric devices, sensors, electrochemical catalysts, etc. The metal part in the composite film can provide electrical conductivity and electron transport pathways, while the tungsten oxide part can regulate optical properties and catalytic performance. By adjusting the ratio and structure of tungsten oxide and metal in the composite film, the optimization and regulation of performance can be realized.
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