The electrode material of tungsten barium electrode has not been directly applied in the photoresist industry. Photoresist, also known as photoresist, is a type of corrosion-resistant film material that changes its solubility through exposure or radiation from ultraviolet light, electron beam, ion beam, X-ray, etc. It is mainly composed of three main components: photosensitive resin, sensitizer, and solvent. It is sensitive to light and is used as a corrosion-resistant coating material in the lithography process. Photoresist can be classified into two categories based on the image it forms: positive and negative, and there are multiple classifications depending on the exposure light source and radiation source.
Photoresist is mainly used for fine pattern processing operations such as display panels, integrated circuits, and semiconductor discrete devices. In this process, photoresist is mainly used to transfer the patterns on the mask board to the oxide layer on the surface of the silicon wafer, and to protect the underlying materials from etching or ion implantation in subsequent processes.
And tungsten barium electrodes, made of alloys of tungsten and barium, are mainly used in fields such as electrochemical analysis and solution electrolysis. It has characteristics such as high stability, low capacitance, high corrosion resistance, and thermal stability, making it excellent in the electrochemical analysis of aqueous solutions of halogen elements, heavy metal ions, and drugs.
Therefore, although tungsten barium electrodes and photoresists are important materials in semiconductor and microelectronics manufacturing processes, their application areas are not the same. At present, there is no evidence or report indicating that the electrode materials of tungsten barium electrodes have direct applications in the photoresist industry.
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