Molybdenum foil specifications vary based on application needs, encompassing size, thickness, purity, and surface condition. 1) Size: Widths range from 10-1000 mm, lengths up to 2000 mm or customized, meeting demands in semiconductors and aerospace. 2) Thickness: From 0.01-2 mm, ultra-thin foil (<0.1 mm) is used in electronics, while thicker foil (>1 mm) suits high-temperature furnace components. 3) Purity: High-purity foil (≥99.95%) is used for precision applications like sputtering targets, standard foil (99-99.9%) for chemical equipment, and low-purity (<99%) for basic molds. 4) Surface Condition: Options include polished (roughness Ra<0.1 μm), acid-washed (oxide-free), and as-rolled (slightly rough), with polished foil for semiconductors and acid-washed for furnaces. 5) Processing: Cold-rolled foil offers high strength (tensile strength 800-1000 MPa), hot-rolled foil better toughness (elongation 15-20%), and powder metallurgy foil suits complex shapes. Specifications also cover flatness (deviation <0.05 mm/m) and tolerances (thickness ±0.01 mm). Custom specifications are common, such as curved foil for aerospace or ultra-thin high-purity foil for electronics. Production uses laser cutting and precision rolling for accuracy, with quality control via dimensional measurement, spectral analysis, and surface testing to meet industry standards, such as tight tolerances in semiconductor manufacturing.
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