Molybdenum foil’s characteristics stem from its unique physical, chemical, and mechanical properties, making it exceptional in various applications. 1) High Melting Point: 2623°C, ideal for 2000°C environments like sapphire crystal growth furnaces. 2) Excellent Mechanical Properties: Tensile strength of 500-1000 MPa, hardness of 150-200 HV, and strong wear resistance, with cold-rolled foil offering higher strength (800-1000 MPa) and hot-rolled better toughness (elongation 15-20%). 3) Low Thermal Expansion: 4.8 × 10⁻⁶/K, matching silicon and sapphire, reducing thermal stress, ideal for semiconductor substrates. 4) Good Conductivity: Electrical conductivity of 1.87 × 10⁷ S/m and thermal conductivity of 138 W/m·K support heat management and current transmission in electronics. 5) Chemical Stability: Resists dilute acids (e.g., hydrochloric acid) and alkalis at room temperature, surpassing iron, but oxidizes above 600°C to form MoO₃, requiring vacuum or inert gas protection. 6) Creep Resistance: Maintains strength (100-200 MPa) at 1000-2000°C, suitable for furnace components. 7) High-Purity Options: ≥99.95% purity minimizes defects, enhancing performance. High-purity foil has smooth surfaces (roughness Ra<0.1 μm), ideal for sputtering targets. Disadvantages include poor low-temperature toughness (prone to brittle fracture) and high cost. Molybdenum foil is widely used in electronics, aerospace, chemicals, and high-temperature furnaces, requiring optimized protection based on environment.
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