Molybdenum foil is widely used in the electronics and information industry due to its high purity, low thermal expansion coefficient, and excellent electrical and thermal conductivity, with key applications in semiconductor manufacturing, display production, photovoltaics, and electronic devices. 1) Semiconductor Manufacturing: Molybdenum foil serves as sputtering targets for depositing thin films to form circuits and as substrates or lead frames, with a thermal expansion coefficient (4.8 × 10⁻⁶/K) close to silicon’s (2.6 × 10⁻⁶/K), minimizing thermal stress. 2) Display Production: It is used in thin-film transistor (TFT) manufacturing as electrodes or wiring, with conductivity (1.87 × 10⁷ S/m) enabling efficient signal transmission and a smooth surface (roughness Ra<0.1 μm) ensuring deposition quality. 3) Photovoltaic Industry: Molybdenum foil acts as back electrodes in solar cells (e.g., CIGS), with thermal conductivity (138 W/m·K) managing heat and corrosion resistance (against dilute acids, alkalis) extending lifespan. 4) Electronic Devices: It is used in X-ray tube anodes or high-power LED heat sinks, with hardness (150-200 HV) and high-temperature stability (100-200 MPa at 1000°C) meeting high-load demands. Typically high-purity (≥99.95%), prepared by cold rolling and polishing, it has a tensile strength of 500-700 MPa. Oxidation above 600°C requires vacuum protection. Advantages include stable performance and thermal compatibility; disadvantages are high cost and oxidation sensitivity. Quality control involves spectral analysis and surface testing to meet electronics precision standards.
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