Molybdenum foil is primarily used as a sputtering target in plasma coating to deposit molybdenum or molybdenum alloy thin films, widely applied in semiconductor, display, and solar cell manufacturing. Plasma coating involves high-energy ions bombarding the target, sputtering atoms onto a substrate to form thin films. Molybdenum foil, typically high-purity (≥99.95%), 0.5-3 mm thick, is cold-rolled with tensile strength of 800-1000 MPa and hardness of 160-200 HV. Polished surfaces (roughness Ra<0.1 μm) ensure uniform sputtering, and low impurities (<50 ppm) minimize film defects. Conductivity (1.87 × 10⁷ S/m) supports efficient plasma discharge, while thermal conductivity (138 W/m·K) manages target heat, extending lifespan. A low thermal expansion coefficient (4.8 × 10⁻⁶/K) matches substrates, reducing stress. Chemically, it resists dilute acids and alkalis at room temperature but requires vacuum protection above 600°C to prevent oxidation. Applications include: 1) Semiconductors: Depositing electrode or gate films; 2) Displays: Forming TFT conductive layers; 3) Photovoltaics: Producing CIGS cell back electrodes. Advantages include high film quality and durable targets; disadvantages are high cost and oxidation sensitivity. Quality control involves spectral analysis, surface testing, and sputtering performance checks to ensure film consistency.
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