Molybdenum foil as a sputtering target in plasma coating offers multiple advantages, meeting high-precision thin-film deposition needs. 1) High Purity: ≥99.95% purity with impurities <50 ppm ensures low-defect films, ideal for semiconductors and displays. 2) Excellent Conductivity: 1.87 × 10⁷ S/m conductivity supports efficient plasma discharge, increasing sputtering rates. 3) Good Thermal Conductivity: 138 W/m·K dissipates heat effectively, preventing target overheating and extending lifespan. 4) Low Thermal Expansion: 4.8 × 10⁻⁶/K matches silicon and glass substrates, reducing stress-induced film cracks. 5) High Strength and Hardness: Tensile strength of 800-1000 MPa and hardness of 160-200 HV resist ion bombardment, minimizing target wear. 6) Surface Quality: Cold-rolled and polished (roughness Ra<0.1 μm), ensuring uniform sputtering and high film quality. 7) Chemical Stability: Resists dilute acids and alkalis at room temperature, suitable for vacuum coating, but requires protection above 600°C to prevent oxidation. Molybdenum supports complex films (e.g., MoS₂) for TFTs and CIGS cells. Disadvantages include high cost and oxidation sensitivity. Quality control involves spectral analysis, surface morphology, and sputtering performance testing to ensure stable target performance.
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