Flatness is a critical quality indicator for molybdenum foil, impacting precision applications like semiconductor substrates and sputtering targets. Flatness refers to the deviation from an ideal plane, typically expressed as deviation per meter (mm/m). 1) High-Precision Foil: Cold-rolled and polished, with flatness deviation <0.05 mm/m, thickness 0.01-0.5 mm, ideal for electronics, with smooth surfaces (roughness Ra<0.1 μm). 2) Standard Foil: Hot-rolled or powder metallurgy-produced, with flatness deviation of 0.05-0.2 mm/m, thickness 0.5-2 mm, possibly with slight waviness, suitable for furnace components. 3) Influencing Factors: Cold rolling uses multi-pass precision rolling to control stress distribution, enhancing flatness; hot rolling at high temperatures may cause minor unevenness due to grain growth; annealing (800-1200°C) relieves internal stress, improving flatness. 4) Processing: High-precision rolling mills, uniform lubrication, and tension control ensure flatness, with laser-cut edges preventing warping. 5) Environmental Impact: Oxidation above 600°C may induce surface stress, reducing flatness, requiring vacuum protection. 6) Testing: Flatness is measured using laser scanners or optical interferometers, with tolerances of ±0.01 mm. High-purity foil (≥99.95%) offers stabler flatness due to fewer impurities. Poor flatness can cause uneven film deposition or assembly errors, necessitating strict process and storage control.
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