The steps of preparing ceramic target tungsten trioxide thin film by radio frequency magnetron sputtering method are as follows:
- Before using the base material, clean the conductive glass ITO. The order is to use deionized water, alcohol, acetone and ultrasonic oscillator for 15 minutes to remove surface stains and organic matter;
- Take out the test piece and blow it dry, put it into the vacuum chamber quickly to prepare for sputtering;
- After the substrate is placed in the vacuum chamber, first use a mechanical rotary pump to pump it to about 3×10-3, then use a condensation pump to pump it to below 2×10-6 for half an hour, and heat the substrate to the experimental temperature. At this time Introduce Ar atmosphere O2 oxygen to deposit under different oxygen atmospheres, pre-sputter the surface of the target to remove impurities and oxide layers, and adjust the sputtering power to (100W).
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